BSM 7: RIE lag in high aspect ratio trench etching of silicon
نویسندگان
چکیده
منابع مشابه
High Aspect Ratio Si Etching in STS2
Deep reactive ion etching (DRIE) is one of the most important etching techniques because it is independent of crystal orientation and does not require any wet process. DRIE can be applied for many applications. For examples, this technique can be used to fabricate MEMS devices (e.g. accelerometers, scanners, etc.), microfluidic devices, electrical through wafer interconnects, and so on. In many...
متن کاملTHE BLACK SILICON METHOD VI: HIGH ASPECT RATIO TRENCH ETCHING FOR MEMS APPLICATIONS - Micro Electro Mechanical Systems, 1996, MEMS '96, Proceedings. 'An Investigation of Micro Structur
Etching high aspect ratio trenches (HART’s) in silicon is becoming increasingly important for MEMS applications. Currently, the most important technique is dry reactive ion etching (ME). This paper presents solutions for the most notorious problems during etching HART’s: tilting and the aspect ratio dependent etching effects such as bowing, RIE lag, bottling, and micrograss or black silicon. To...
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High aspect ratio titanium nitride (TiN) grating structures are fabricated by the combination of deep reactive ion etching (DRIE) and atomic layer deposition (ALD) techniques. TiN is deposited at 500 ◦C on a silicon trench template. Silicon between vertical TiN layers is selectively etched to fabricate the high aspect ratio TiN trenches with the pitch of 400 nm and height of around 2.7 μm. Diel...
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High aspect ratio microchannels using high thermal conductivity materials such as silicon carbide (SiC) have recently been explored to locally cool micro-scale power electronics that are prone to on-chip hot spot generation. Analytical and finite element modeling shows that microchannels used for localized cooling should have high aspect ratio features (above 8:1) to enable the heat flux levels...
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This work is dedicated to my dear grandmother, who has not only taught me that learning is a lifelong matter, but has also inspired me by being an example herself even at the age of 80. for the help on design and modeling; and all the members of the IMEMS group for creating a collaborative and pleasant atmosphere. Special thanks to all the MiRC Cleanroom staff, who I am greatly indebted to, for...
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ژورنال
عنوان ژورنال: Microelectronic Engineering
سال: 1997
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(96)00142-6